对苯二酚
荧光粉
氟化物
化学
水分
化学工程
自来水
材料科学
无机化学
复合材料
环境工程
有机化学
环境科学
光电子学
工程类
作者
Feilong Liu,Yingyuan Chen,Bojana Milićević,Chunyan Jiang,Senchuan Huang,Lei Zhou,Jianbang Zhou,Mingmei Wu
标识
DOI:10.1016/j.colsurfa.2023.130954
摘要
A facile strategy to modify the surface of K2SiF6:Mn4+ (KSFM) with commercially available hydrophilic hydroquinone (HQ) has been developed and waterproof stability (moisture resistance) of the KSFM has been significantly improved. It has been demonstrated that there are strong interactions between KSFM and HQ on the interface due to the hydrogen bonds of fluorine in KSFM with hydrogen in HQ. The relative luminous intensity of HQ-modified KSFM (denoted as KSFM-HQ) remained 99.7% of its initial value after immersion in water for 336 h, remarkable higher than that of KSFM which remained only 38.0%. It is proposed that the high water resistance of KSFM-HQ is achieved via two possible mechanisms: in situ decomposition of dark brown manganese (owing to the hydrolysis of [MnF6]2−) on the KSFM crystal surface and consequently the formation of a more protective Mn4+-free layer. The process effectively combines the advantages of transparent organic materials (herein HQ) before immersion in water and durable moisture resistance of inorganic materials (herein K2SiF6) on surface after immersion in water. The importance of HQ loading on moisture-sensitive fluoride phosphors has been further confirmed by using HQ-treated K2GeF6:Mn4+ (KGFM) as an additional example. This strategy provides a one-of-a-kind way to the development of water-resistant Mn4+-doped fluoride phosphors with high luminous stability for potential applications in water-borne fluorescent anti-counterfeiting ink and even warm WLEDs operating in high humidity.
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