异质结
肖特基势垒
材料科学
半导体
欧姆接触
肖特基二极管
密度泛函理论
凝聚态物理
金属
光电子学
纳米技术
二极管
计算化学
物理
化学
冶金
图层(电子)
作者
V. Sorkin,Hangbo Zhou,Zhi Gen Yu,Kah‐Wee Ang,Yong‐Wei Zhang
标识
DOI:10.1021/acsami.4c02294
摘要
We propose an atomically resolved approach to capture the spatial variations of the Schottky barrier height (SBH) at metal-semiconductor heterojunctions. This proposed scheme, based on atom-specific partial density of states (PDOS) calculations, further enables calculation of the effective SBH that aligns with conductance measurements. We apply this approach to study the variations of SBH at MoS
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