材料科学
图层(电子)
涂层
溅射
退火(玻璃)
原子层沉积
电子束物理气相沉积
光电子学
旋涂
化学工程
溅射沉积
氧化铟锡
钙钛矿太阳能电池
氧化锡
氧化物
复合材料
能量转换效率
薄膜
纳米技术
化学气相沉积
冶金
工程类
作者
Tina Wahl,Jonas Hanisch,Jan‐Philipp Becker,Erik Ahlswede
标识
DOI:10.1016/j.solmat.2024.112825
摘要
In semi-transparent perovskite solar cells (PSCs) comprising a sputtered top electrode, the minimisation of detrimental sputter damage and/or its curing by post-processing treatment is essential to reach high efficiencies. In this work, we investigate the influence of sputter damage and post-deposition annealing steps for different electron transport layers (ETLs) in PSCs without the need of a protective buffer layer such as tin oxide deposited by atomic layer deposition. We compare solution-processed 6,6-Phenyl C61 butyric acid methyl ester (PCBM) to thermally evaporated C60, each in combination with a bathocuproine (BCP) layer deposited by spin coating or thermal evaporation including a thickness variation. In general, we find that C60 is more resilient against sputter damage and thus C60-based cells show higher as-grown power conversion efficiencies (PCEs). Post-deposition annealing of the complete cell stack increases the PCE further to values > 16 % on 0.5 cm2 active area. However, we observe that the remaining solvent in the spin-coated PCBM layer is highly beneficial for the curing of the sputter damage during post-deposition annealing and we achieve even higher PCEs for cells incorporating solution-processed PCBM with up to > 18 % on 0.5 cm2. We show an alternative way to reach high efficiency semi-transparent perovskite solar cells without using thermally evaporated C60 and/or a buffer layer like tin oxide deposited by atomic layer deposition (ALD).
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