材料科学
数码产品
光电子学
硫系化合物
半导体
纳米技术
晶体管
电子迁移率
工程物理
电气工程
电压
工程类
作者
Ao Liu,Huihui Zhu,Taoyu Zou,Youjin Reo,Gi‐Seong Ryu,Yong‐Young Noh
标识
DOI:10.1038/s41467-022-34119-6
摘要
The exploration of stable and high-mobility semiconductors that can be grown over a large area using cost-effective methods continues to attract the interest of the electronics community. However, many mainstream candidates are challenged by scarce and expensive components, manufacturing costs, low stability, and limitations of large-area growth. Herein, we report wafer-scale ultrathin (metal) chalcogenide semiconductors for high-performance complementary electronics using standard room temperature thermal evaporation. The n-type bismuth sulfide delivers an in-situ transition from a conductor to a high-mobility semiconductor after mild post-annealing with self-assembly phase conversion, achieving thin-film transistors with mobilities of over 10 cm2 V-1 s-1, on/off current ratios exceeding 108, and high stability. Complementary inverters are constructed in combination with p-channel tellurium device with hole mobilities of over 50 cm2 V-1 s-1, delivering remarkable voltage transfer characteristics with a high gain of 200. This work has laid the foundation for depositing scalable electronics in a simple and cost-effective manner, which is compatible with monolithic integration with commercial products such as organic light-emitting diodes.
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