材料科学
氩
退火(玻璃)
溅射
溅射沉积
结晶
薄膜
锌
氧气
腔磁控管
氩气
气体压力
等离子体
分析化学(期刊)
复合材料
光电子学
化学工程
纳米技术
冶金
化学
物理
工程类
有机化学
石油工程
量子力学
色谱法
作者
Wenping Dang,Yong Qing Fu,Jikui Luo,Andrew J. Flewitt,W.I. Milne
标识
DOI:10.1016/j.spmi.2007.04.081
摘要
Zinc oxide thin films were deposited by radio frequency magnetron sputtering at room temperature using a metallic zinc target in a gas mixture of argon and oxygen. Plasma power, oxygen /argon gas ratio, gas pressure, and substrate temperature were varied, and an experimental design method was used to optimize these deposition parameters by considering their interdependence. Crystalline structures and film stresses were examined. Post-deposition rapid thermal annealing was also carried out to observe its effects on the film properties. Statistical analysis was then used to find the optimal sputtering conditions. Results indicated that plasma power and gas pressure have the largest effects on film crystallization and stress and that postdeposition annealing can be used to improve the quality of the film properties.
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