光引发剂
光致聚合物
聚合
光敏性
固化(化学)
材料科学
光化学
发色团
高分子化学
紫外线固化
单体
化学
复合材料
聚合物
光电子学
作者
Kaori Sameshima,Hisatoshi Kura,Yuki Matsuoka,Hikaru Sotome,Hiroshi Miyasaka
标识
DOI:10.35848/1347-4065/ac55e4
摘要
Abstract A highly sensitive photoinitiator plays an important role in the improvement of photo-polymerization for the advanced manufacturing of microsteric structures of the color filter. In the present work, we have investigated the photosensitivity of a novel oxime ester photoinitiator with benzocarbazole as a chromophore in the polymerization process. By comparing the residual thickness of polymerized films in the color resists with those obtained by other oxime ester photoinitiators, it was found that the high absorption intensity at the i-line significantly increased the bottom-curing performance with good surface curing. Moreover, it was revealed that the high quantum yield of this new photoinitiator also contributed to the increase in the high photosensitivity.
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