极紫外光刻
极端紫外线
体积热力学
新产品开发
计算机科学
透射率
材料科学
业务
纳米技术
光学
光电子学
物理
激光器
量子力学
营销
作者
Raymond Lafarre,R. Maas
摘要
In the past year ASML NXE pellicle has made a significant steps. ASML EUV Customers can order in volume pellicles, which meet all the production KPI. The next step to meet the industry high volume manufacturing requirements, is releasing high EUV transmittance, high power compatibility and superior imaging performance membranes, made of novel materials. In this presentation we will give a comprehensive overview on the current development status of the NXE pellicle product, including a future outlook to the EUV pellicle roadmap.
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