光催化
异质结
降级(电信)
构造(python库)
材料科学
方案(数学)
化学工程
催化作用
化学
光电子学
计算机网络
数学
计算机科学
生物化学
电信
工程类
数学分析
作者
Hassan Sepehrmansourie,Hassan Alamgholiloo,Nader Noroozi Pesyan,Mohammad Ali Zolfigol
标识
DOI:10.1016/j.apcatb.2022.122082
摘要
Well-organized UiO-66-on-MIL-125 growth onto g-C 3 N 4 nanosheets was developed for ofloxacin (OFL) antibiotics degradation under visible light irradiation (λ >420 nm). First, NH 2 -MIL-125 as a host MOF was prepared by a solvothermal method, and then UiO-66 crystals were grown onto the NH 2 -MIL-125 surface with the same method. Subsequently, g-C 3 N 4 nanosheets were decorated onto Zr-MOF-on-Ti-MOF surface to obtain a new type of the double Z-scheme UiO-66/NH 2 -MIL-125/g-C 3 N 4 heterojunction. Under visible light irradiation, this double Z-scheme heterojunction acts as a highly efficient photocatalyst for the degradation of OFL with a rate constant of 0.07 min −1 , which is about 1.79 times higher than that of pristine UiO-66-on-MIL-125. Also, the findings obtained from radical trapping and EPR indicated that • OH and • O 2 − play an essential role in OFL photodegradation. The current study provides not only new horizons to architecture MOF on other MOFs but also develops Z-scheme heterojunction materials for removing emerging pollutants from wastewater. • A new type of double Z-scheme photocatalyst of UiO/MIL/CN was fabricated. • The presented nanostructure shows excellent performance for ofloxacin degradation under visible light irradiation. • Double Z-scheme of UiO/MIL/CN promoted the separation of electron-hole pairs. • • O 2 − and • OH radicals are active species for ofloxacin degradation. • Antibiotic degradation route and photocatalytic mechanism were predicted.
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