可靠性(半导体)
负偏压温度不稳定性
材料科学
光电子学
栅极电介质
电介质
阈值电压
表征(材料科学)
MOSFET
可靠性工程
电子工程
电气工程
电压
纳米技术
晶体管
工程类
功率(物理)
物理
量子力学
作者
Guibao Wang,Lei Yuan,Xiaowen Wang,Yuming Zhang,Renxu Jia
标识
DOI:10.1016/j.jcrysgro.2023.127086
摘要
Reliability characteristics play a critical role in studied of SiC MOSFETs, including gate oxygen, long-term and short circuit reliability. This article presents a long-term reliability and device high temperature performance. Firstly, the static performance evaluation of the device at high temperature is introduced. Next, the gate bias test induces the threshold voltage shift, arguing that the instability is due to the capture of electrons by the SiC/SiO2 interface traps and the gate dielectric near-interface traps. Finally, the reliability characterization is verified using the common methods of high temperature reverse bias and high temperature gate bias tests. The results exhibit the superior reliability and performance of 1200 V SiC MOSFETs.
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