Enhanced UV–Vis Rejection Ratio in Metal/BaTiO3/β‐Ga2O3 Solar‐Blind Photodetectors
材料科学
光电探测器
光电子学
金属
冶金
作者
Nathan Wriedt,Lingyu Meng,Dong Su Yu,Chris Chae,Kyle J. Liddy,Ashok Dheenan,Sushovan Dhara,Roberto C. Myers,Oleg Maksimov,Richard Blakeley,Sanjay Krishna,Jinwoo Hwang,Hongping Zhao,Joe F. McGlone,Siddharth Rajan
Abstract The fabrication and characterization of metal/BaTiO 3 /β‐Ga 2 O 3 solar‐blind photodetectors are reported. β‐Ga 2 O 3 is a promising material for solar‐blind photodetectors due to its large bandgap and the availability of low defect‐density melt‐grown substrates. In this work, structures are introduced that employ high‐permittivity dielectric/semiconductor heterojunctions to enhance the performance of a Schottky photodetector. It is shown that integrating the high‐k dielectric BaTiO 3 reduces the dark current by ≈10 4 , all but eliminates illumination induced Schottky barrier lowering, and increases the UV–vis rejection ratio by a factor greater than 9 × 10 3 compared to a Schottky photodetector. It is hypothesized that the high permittivity of the dielectric overcomes the influence of self‐trapped holes in Ga 2 O 3 to reduce the peak electric field at the dielectric/metal interface, thereby eliminating the effects of Schottky barrier lowering on illuminated β‐Ga 2 O 3 photodetectors. Additionally, it is hypothesized that the increase in the UV–vis rejection ratio is caused by the “dead layer” that forms at the BaTiO 3 /Pt interface.