铁磁性
凝聚态物理
材料科学
单层
电子迁移率
光电子学
纳米技术
物理
作者
Lei Qiao,Musen Li,Yaning Cui,Shaowen Xu,Jeffrey R. Reimers,Wei Ren
出处
期刊:Nano Letters
[American Chemical Society]
日期:2024-05-20
卷期号:24 (21): 6403-6409
被引量:11
标识
DOI:10.1021/acs.nanolett.4c01416
摘要
Using density functional theory (DFT), we investigate that two possible phases of VSi2N4 (VSN) may be realized, one called the "H phase" corresponding to what is known from calculation and herein the other new "T phase" being stabilized by a biaxial tensile strain of 3%. Significantly, the H phase is predicted to display a giant carrier mobility of 1 × 106 cm2 V-1 s-1, which exceeds that for most 2D magnetic materials, with a Curie temperature (TC) exceeding room temperature and a band gap of 2.01 eV at the K point. Following the H-T phase transition, the direct band gap shifts to the Γ point and increases to 2.59 eV. The Monte Carlo (MC) simulations also indicate that TC of the T phase VSN can be effectively modulated by strain, reaching room temperature under a biaxial strain of -4%. These results show that VSN should be a promising functional material for future nanoelectronics.
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