Investigation of the morphology and structural transformation of 6H-SiC induced by a single femtosecond laser pulse

材料科学 飞秒 激光器 拉曼光谱 扫描电子显微镜 碳化硅 无定形固体 光电子学 分析化学(期刊) 光学 结晶学 复合材料 化学 物理 色谱法
作者
Hongsheng Quan,Ruishi Wang,Wang Li,Dezhi Zheng,Weiqian Zhao,Zhonghuai Wu,Ke-Mi Xu
出处
期刊:Optics and Laser Technology [Elsevier BV]
卷期号:176: 111015-111015 被引量:1
标识
DOI:10.1016/j.optlastec.2024.111015
摘要

Silicon carbide (SiC) is promising in semiconductor devices operating in extreme environments owing to its excellent properties including wide forbidden band, high thermal conductivity, thermal stability, chemical inertness, and high saturation rate. However, its Mohs hardness of 9 poses challenges for conventional machining techniques. Femtosecond laser processing offers an effective alternative for SiC processing, yet the underlying mechanism of interaction between laser pulse and SiC remains unclear. Herein we studied the mechanism of laser interacted with SiC, thoroughly investigated the structural transformation and morphology change of single crystal 6H-SiC induced by single ultrafast laser pulse irradiation at different pulse energies. The morphology changes of single pulse induced crater, i.e., diameter and depth, are characterized by scanning electron microscopy (SEM) and atomic force microscopy (AFM). The structural transformation and changes in the chemical composition are analyzed using micro-Raman spectroscopy. Moreover, the evolution of lattice arrangement is revealed by high-resolution transmission electron microscopy (TEM). At low pulse energies just above the modification threshold, the sample surface undergoes moderate modification, no larger craters and amorphous silicon are produced. At even higher energies, nonlinear absorption and ionization occur under ultrafast laser irradiation, the energy of the hot free electrons is transferred to the cold crystal lattice through electron–phonon scattering, causing a sharp increase in the lattice temperature. Si-C crystal bonds are broken and melting, resolidification and the generation of amorphous and crystalline silicon phase appeared.
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