极紫外光刻
氟化物
化学选择性
平版印刷术
化学
可扩展性
纳米技术
计算机科学
材料科学
有机化学
催化作用
光电子学
数据库
无机化学
作者
Paul LaBeaume,Kenneth Hernández‐Burgos,Edon Vitaku,Tomas Marangoni,Emad Aqad,Mingqi Li,Conner Hoelzel,Joseph Lachowski,M. J. S. Hayes,Sabrina Wong,Jingyi Li,Amy Kwok,Wanyi Huang,Jong Hyeok Park,Huan He,Hannah Mackay,Cong Liu,James F. Cameron,Cheng-Bai Xu,Qiuzhe Xie,Karen Petrillo
摘要
Per- and polyfluoroalkyl substances (PFAS) have been identified by various regulatory bodies as substances of concern. In line with the objective of safer and sustainable by design, a comprehensive program has been initiated to address these concerns. Part of this program includes the development of non -fluorinated photoacid generators (PAGs) without introducing new chemicals with unintended consequences. Using computational chemistry and synthetic organic chemistry , several scaffolds amenable to PAG library design have been realized. These novel PAGs offer facile tunability and advantages in many critical design parameters such as pKa, diffusion, absorption, shelf-life stability, and scalability. These early generation non-fluorinated PAGs show competitive and similar lithographic performance compared to fluorinated PAGs in i-line, krypton fluoride (KrF) laser, argon fluoride (ArF) laser and extreme ultraviolet (EUV) lithography.
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