材料科学
钙钛矿(结构)
平面的
退火(玻璃)
薄膜
光电子学
非阻塞I/O
结晶学
纳米技术
复合材料
催化作用
计算机科学
生物化学
计算机图形学(图像)
化学
作者
Xiaolu Zheng,Zhaoning Song,Zhiliang Chen,Sandip S. Bista,Pengbin Gui,Niraj Shrestha,Cong Chen,Chongwen Li,Xinxing Yin,Rasha A. Awni,Hongwei Lei,Chen Tao,Randy J. Ellingson,Yanfa Yan,Guojia Fang
摘要
An appropriately combined triple interface modification, i.e., post-annealing, O2-plasma, and KCl treatments, is employed to ameliorate the optoelectronic properties of sputtered NiOx films and achieve better device performance.
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