Microstructure, Texture, and Hardness Evolution of Cold-Rolled High-Purity Ti Sheet During Annealing at 350 °C to 550 °C

材料科学 电子背散射衍射 退火(玻璃) 再结晶(地质) 成核 微观结构 粒度 结晶学 冶金 复合材料 热力学 化学 生物 物理 古生物学
作者
Xing Hu,Linjiang Chai,Jing Shen,Hao Wu,Yuqiong Li,Jianwei Cheng,Jinru Luo,Lihua Yao
出处
期刊:Metallurgical and Materials Transactions [Springer Science+Business Media]
卷期号:53 (6): 2086-2098 被引量:3
标识
DOI:10.1007/s11661-022-06651-z
摘要

The microstructural, textural, and hardness evolution of a cold-rolled high-purity Ti sheet (50 pct reduction in thickness) during isochronal annealing at 350 °C to 550 °C was investigated by jointly using electron backscatter diffraction, electron channel contrast imaging, X-ray diffraction, and hardness test, with a dedicated correlation analysis between them performed. Results show that recrystallization nucleation starts at 400 °C with prior grain boundaries as preferential sites while fully recrystallized structures were obtained after annealing at 550 °C for 1 hours. During the primary recrystallization, contrary to earlier reports, considerable textural changes occur: the prior bimodal basal texture characteristic is essentially replaced by a ring-like basal texture. Such a textural change is attributed to the orientation-gradient-related subgrain coalescence mechanism that dominates the recrystallization nucleation of the high-purity Ti sheet. Specimen hardness always decreases with increasing the annealing temperature (from 234.3 ± 5.8 to 135.9 ± 2.9 HV), which is closely related to continuous variations of grain sizes and dislocation densities (mainly stored in low-angle boundaries). Quantitative analyses reveal that both grain sizes and dislocation densities have mild effects on the hardness change when annealed below 450 °C. However, the decrease in dislocation density leads to more significant softening than grain coarsening when the annealing temperature exceeds 450 °C.
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