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Simple maskless lithography tool with a desk-top size using a liquid-crystal-display projector

平版印刷术 投影机 无光罩微影 材料科学 书桌 简单(哲学) 纳米技术 液晶显示器 光学 计算机科学 光电子学 电子束光刻 物理 抵抗 图层(电子) 哲学 操作系统 认识论
作者
Toshiyuki Horiuchi,Soichiro Koyama,Hiroshi Kobayashi
出处
期刊:Microelectronic Engineering [Elsevier]
卷期号:141: 37-43 被引量:8
标识
DOI:10.1016/j.mee.2015.01.003
摘要

A maskless exposure system was developed utilizing a commercial LCD video-projector.Only the projection optics was changed to a camera lens for macro-photography.The system is very simple, and has a small desk-top size of 300iÂ?400iÂ?500mm3.Patterns with a minimum width of 14µm were smoothly printed in 14.3iÂ?10.7mm2 field.The new lithography tool was fabricated by an expenditure of only Â?500,000Â?Â?3500. A very simple and low-cost maskless exposure tool with a desk-top size was developed for applying to fabrications of various micro electro mechanical systems (MEMS) and bio-devices. A commercial projector with three liquid crystal display (LCD) panels of red, green, and blue colors was utilized as it was, except attaching a macro-lens for a camera after removing the magnification optics of the original projector. Therefore, the sizes were as small as 300 wideiÂ?400 deepiÂ?500 high mm3, and the system was fabricated at a very small expense (Â?500,000Â?Â?3500). Pixel pitches on the LCD panel were 8.5µm, and the 7.4-µm square pixels were projected onto a wafer in a magnification ratio of 1.65. Efficient pixel numbers were 1024iÂ?768, and the exposure field sizes were 14.3iÂ?10.7mm2. Using the system, isolated line patterns with a width corresponding to one pixel size of approximately 14µm, and 1:1 lines-and-spaces (L&S) patterns with a width of two pixel sizes of 28µm were stably printed. Not only line patterns in orthogonal directions, but also radial oblique patterns were clearly and smoothly printed, and complicated arbitrary patterns were also printed. These projection ratio and pattern widths were decided considering the present applications to fabrications of micro-fluidic devices and lens arrays. If smaller patterns are required, the minimum pattern size and the projection ratio are conformably changed in principle. Because arbitrary patterns designed on a personal computer are directly printed on a wafer, preparations of expensive reticles are not necessary. Accordingly, besides the system cost and footprint are drastically saved, working expenses are much saved.
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