电介质
材料科学
辐照
氮化硼
化学气相沉积
分析化学(期刊)
紫外线
硼
光电子学
化学
复合材料
有机化学
物理
核物理学
作者
Zhengjun Zhang,Chiharu Kimura,Takashi Sugino
摘要
Boron carbon nitride (BCN) films with a low dielectric constant are synthesized by plasma-assisted chemical-vapor deposition. The dielectric constant is measured for the BCN films irradiated with monochromatic ultraviolet lights of 300 and 365 nm in wavelength. It is found that the dielectric constant is decreased due to a 300-nm irradiation while the dielectric constant is enhanced due to a 365-nm irradiation. A reduction in the B–C bond and an increase in the C–N bond occur in the BCN film after the 300-nm irradiation. On the other hand, the 365-nm irradiation leads to an increase in the B–C bond and a reduction in the C–N bond in the film. The 300-nm irradiation is effective in reducing the dielectric constant, suggesting the removal of the molecules with a large polarization.
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