兴奋剂
材料科学
催化作用
密度泛函理论
带隙
氢
分析化学(期刊)
纳米技术
化学
光电子学
计算化学
有机化学
色谱法
生物化学
作者
Mamta Devi Sharma,Chavi Mahala,Brindaban Modak,Surojit Pande,Mrinmoyee Basu
出处
期刊:Langmuir
[American Chemical Society]
日期:2021-04-12
卷期号:37 (16): 4847-4858
被引量:27
标识
DOI:10.1021/acs.langmuir.1c00036
摘要
To replace Pt-based compounds in the electrocatalytic hydrogen evolution reaction (HER), MoS2 has already been established as an efficient catalyst. The electrocatalytic activity of MoS2 is further improved by tuning the morphology and the electronic structure through doping, which helps the band energy position to be modified. Presently, thin sheets of MoS2 (MoS2-TSs) are synthesized via a microwave technique. Thin sheets of MoS2 can outperform nanosheets of MoS2 in the HER. Further, the efficiency of the thin sheets is improved by doping with different metals like Cu, V, Zn, Mn, Fe, Sn, etc. "Cu"- and "V"-doped MoS2-TSs are highly efficient for the HER. At a fixed potential of −0.588 V vs RHE, Cu-doped MoS2 (Cu-MoS2-TS), V-doped MoS2 (V-MoS2-TS), and MoS2-TS can generate current densities of 327.46, 308.45, and 127.82 mA/cm2, respectively. The electrochemically active surface area increases nearly 7.7-fold and 2.5-fold for Cu-MoS2-TS and V-MoS2-TS than for MoS2-TS, respectively. Cu-MoS2-TS shows exceptionally high electrocatalytic stability up to 140 h in an acidic medium (0.5 M H2SO4). First-principles calculations using density functional theory (DFT) are performed, which are well matched with the experimental observations. DFT calculations dictate that after doping with "V" and "Cu" both valance band maxima and conduction band minima are uplifted, which indicates the higher hydrogen-ion-reducing ability of M-MoS2-TS (M = Cu, V) compared to bare MoS2-TS.
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