Characterization of ZnO/Cu/ZnO multilayers structure for solar cell devices

A series of ZnO/Cu/ZnO multilayer films has been fabricated from zinc and copper metallic targets by simultaneous RF and DC magnetron sputtering. The influences of the ZnO and Cu layer thicknesses, and Ar flow rate on the optical, electrical and structural properties of the films were investigated. The optical and electrical properties of the multilayers were studied by optical spectrometry and four point probe measurements, respectively. The thickness of the ZnO layers were varied between 20 and 60 nm and the Cu layers were between 5 and 15 nm, the optimum thin film structures were deposited under 12 sccm Ar flow rate. Low sheet resistance and high transmittance were obtained when the film was prepared using thickness of ZnO (60 nm)/Cu (15 nm)/ZnO (60 nm).