钛
钻石
电子亲和性(数据页)
工作职能
肖特基势垒
材料科学
X射线光电子能谱
分析化学(期刊)
费米能级
电子
化学
纳米技术
光电子学
冶金
图层(电子)
化学工程
工程类
有机化学
物理
二极管
量子力学
色谱法
分子
作者
J. van der Weide,R. J. Nemanich
出处
期刊:Journal of vacuum science & technology
[American Vacuum Society]
日期:1992-07-01
卷期号:10 (4): 1940-1943
被引量:103
摘要
Titanium was deposited on a natural type IIb diamond surface with a (111) orientation. The titanium-diamond interface was studied with ultraviolet photoemission spectroscopy, using 21.2 eV light. Prior to deposition, the diamond was chemically cleaned, and a sharp (0.5 eV full width at half-maximum) peak was observed at the position of the conduction band, indicating a negative electron affinity surface. After a subsequent argon plasma clean this peak disappeared, while the spectrum shifted 0.5 eV towards higher energies. Upon submonolayer titanium deposition the spectrum shifted 0.5 eV down, while the negative electron affinity peak reappeared. Further titanium depositions caused this titanium induced negative electron affinity peak to be attenuated, indicating that the emission originated from the interface. By determining the relative positions of the diamond valence band edge and the titanium Fermi level, the Schottky barrier height of titanium on diamond (111) was measured and found to be 1.0±0.2 eV. A model for the observed titanium induced negative electron affinity is proposed, based on the Schottky barrier height of titanium on diamond, and the work function of titanium.
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