材料科学
扫描电子显微镜
硅
氮化硅
X射线光电子能谱
润滑油
接触角
离子液体
相对湿度
化学工程
复合材料
离子键合
湿度
氧化物
离子
冶金
有机化学
化学
催化作用
工程类
物理
热力学
作者
Andrea Arcifa,Antonella Rossi,Rosa M. Espinosa‐Marzal,Nicholas D. Spencer
标识
DOI:10.1021/acsami.5b09370
摘要
In this study, the tribological behavior of silica/silicon surfaces lubricated with the ionic liquid 1-ethyl-3-methylimidazolium ethylsulfate ([EMIM] EtSO4) was investigated. Tests were carried out in the presence of either humid air (45–55% relative humidity) or in a nitrogen atmosphere, and the results were compared with those obtained using pure water as a lubricant. The cross-sectional analysis of the contact area performed by focused-ion-beam scanning electron microscopy indicated the presence of cracks in the subsurface region, showing that brittle fracture contributed to wear. Sliding promoted the formation of a third body, the presence of which was indicated by optical and secondary electron microscopy. X-ray photoelectron spectroscopy showed that the third body was mostly composed of silicon oxides. The accumulation of the debris was controlled by the presence of water: in the presence of a nitrogen atmosphere, particles were trapped between the sliding surfaces, whereas in the case of humid air, the debris was progressively removed from the contact. Notably, the presence of trapped particles was associated with higher values of wear coefficients of both disks and pins. In addition, a lower roughness was observed along the direction of sliding in the case of water-containing ionic liquid. The observed trends in wear and the combined results of the various techniques, as well as the comparison with tests carried out in the presence of pure water, all point to the characteristic tribochemical reactions of water with silicon-based materials, namely, the formation of a sacrificial layer of hydrated oxide and the dissociative adsorption of water at crack tips of SiO2. In the absence of water, the lack of a tribochemical mechanism forming a sacrificial layer leads to a microfracture-dominated wear mechanism over the entire duration of the test, thus leading to more severe wear. The possible occurrence of stress-induced phase transformation of silicon during sliding is also discussed.
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