Logic-in-memory based on an atomically thin semiconductor

冯·诺依曼建筑 逻辑门 电子线路 晶体管 可编程逻辑器件 数码产品 通流晶体管逻辑 逻辑族 计算机科学 计算机体系结构 嵌入式系统 逻辑综合 电气工程 数字电子学 工程类 电压 操作系统 算法
作者
Guilherme Migliato Marega,Yanfei Zhao,Ahmet Avşar,Zhenyu Wang,Mukesh Tripathi,Aleksandra Rađenović,András Kis
出处
期刊:Nature [Springer Nature]
卷期号:587 (7832): 72-77 被引量:366
标识
DOI:10.1038/s41586-020-2861-0
摘要

The growing importance of applications based on machine learning is driving the need to develop dedicated, energy-efficient electronic hardware. Compared with von Neumann architectures, which have separate processing and storage units, brain-inspired in-memory computing uses the same basic device structure for logic operations and data storage1–3, thus promising to reduce the energy cost of data-centred computing substantially4. Although there is ample research focused on exploring new device architectures, the engineering of material platforms suitable for such device designs remains a challenge. Two-dimensional materials5,6 such as semiconducting molybdenum disulphide, MoS2, could be promising candidates for such platforms thanks to their exceptional electrical and mechanical properties7–9. Here we report our exploration of large-area MoS2 as an active channel material for developing logic-in-memory devices and circuits based on floating-gate field-effect transistors (FGFETs). The conductance of our FGFETs can be precisely and continuously tuned, allowing us to use them as building blocks for reconfigurable logic circuits in which logic operations can be directly performed using the memory elements. After demonstrating a programmable NOR gate, we show that this design can be simply extended to implement more complex programmable logic and a functionally complete set of operations. Our findings highlight the potential of atomically thin semiconductors for the development of next-generation low-power electronics. Logic operations and reconfigurable circuits are demonstrated that can be directly implemented using memory elements based on floating-gate field-effect transistors with monolayer MoS2 as the active channel material.
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