光催化
等离子体处理
催化作用
蚀刻(微加工)
等离子体
材料科学
兴奋剂
等离子体刻蚀
氢
化学工程
离子
纳米技术
化学
光化学
化学物理
光电子学
有机化学
图层(电子)
工程类
物理
量子力学
作者
Rui Wang,Guangshun Che,Changhua Wang,Chunyao Liu,Baoshun Liu,Bunsho Ohtani,Yichun Liu,Xintong Zhang
出处
期刊:ACS Catalysis
日期:2022-09-23
卷期号:12 (19): 12206-12216
被引量:26
标识
DOI:10.1021/acscatal.2c03427
摘要
Plasma processing of photocatalysts can conveniently change the surface chemistry, introducing extrinsic or intrinsic surface doping, holding promise to make photocatalysts more active without altering the bulk properties. While gas plasma has long been employed to process photocatalysts, it is hard to avoid the surface dry etching caused by the high-energy charged ions in the plasma with a long mean free path, which results in excessive defects or even deactivation dependent on the kind of photocatalyst. Herein, we propose an innovative alcohol solution plasma approach to process the benchmarked Degussa P25-TiO2 photocatalyst. By virtue of the short mean free path of charged ions in the solution phase, high plasma density, and additional hydrogen doping, the alcohol plasma processing renders the surface amorphization of TiO2 particles and diminishes surface oxygen vacancies. A 124-fold increase of photocatalytic H2 evolution is achieved after alcohol solution plasma processing, which is attributed to the surface-amorphization-induced decrease in surface deep electron traps and upshifted energy level of electron traps. The alcohol solution plasma processing also outperforms water plasma processing and highlights a promising strategy of modulation of surface electronic properties for photocatalysis.
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