超晶格
退火(玻璃)
材料科学
溅射
氧化物
硅
纳米技术
薄膜
光电子学
冶金
作者
Chu-Yun Hsiao,Chuan‐Feng Shih,K. W. Su,Hui-Ju Chen,Sheng-Wen Fu
摘要
This work involves as-prepared SiOx (x≤2) films that were deposited by reactive sputtering. The regular Si/SiO2 superlattices were self-assembled without post-annealing. The periodicity of Si/SiO2 superlattices was modulated by varying the oxygen flow rate and was associated with x in SiOx in the range 2–1.3. Si/SiO2 superlattices were formed under compressive stress and the factors that governed the periodicity were discussed.
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