材料科学
扫描电子显微镜
等离子体
硅
氢
无定形固体
非晶硅
垂直的
航程(航空)
折射率
分子物理学
分析化学(期刊)
结晶学
晶体硅
复合材料
化学
冶金
光电子学
几何学
物理
数学
有机化学
色谱法
量子力学
作者
J. C. Knights,G. Lucovsky,R. J. Nemanich
标识
DOI:10.1016/0022-3093(79)90084-x
摘要
The relationships between hydrogen vibrational spectra, electron spin densities and refractive index are investigated for a range of plasma-deposited amorphous silicon-hydrogen alloys. Results are also presented on the morphology of thick films as shown by scanning electron microscopy. A model is proposed for the structural origin of defects in these alloys based on voids that grow perpendicular to the film surface and are associated with coupled SiH2 units.
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