X射线光电子能谱
工作职能
分析化学(期刊)
紫外光电子能谱
材料科学
蒸发
场电子发射
薄膜
化学计量学
脉冲激光沉积
紫外线
光谱学
化学
金属
电子
核磁共振
物理化学
纳米技术
光电子学
热力学
量子力学
物理
冶金
色谱法
作者
Steven B. Fairchild,Tyson C. Back,P. T. Murray,M. Cahay,D. Shiffler
出处
期刊:Journal of vacuum science & technology
[American Institute of Physics]
日期:2011-04-13
卷期号:29 (3)
被引量:29
摘要
Thin films of cesium iodide (CsI) were deposited by pulsed laser deposition and by thermal evaporation onto Si substrates and were characterized by x-ray diffraction, x-ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy, and Kelvin probe measurements. The thermally evaporated films were found to be stoichiometric whereas the pulsed laser deposited films showed the presence of a Cs/CsI mixture. The latter is supported by UPS measurements whose Fermi edge indicates the presence of a metallic component (elemental Cs). The presence of a Cs/CsI mixture is also supported by the Kelvin probe work function values found to be in the range of 2.6–2.8 eV, a value in excess of the 2.1 eV reported for elemental Cs. This paper addresses the physical mechanisms responsible for the presence of the elemental Cs in the films and its ramification to their field emission properties.
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