材料科学
磁矩
溅射
微观结构
合金
饱和(图论)
薄膜
猝灭(荧光)
分析化学(期刊)
磁化
稀释
基质(水族馆)
凝聚态物理
冶金
热力学
化学
纳米技术
磁场
物理
地质学
色谱法
组合数学
海洋学
荧光
数学
量子力学
作者
A. Fartash,H. Óesterreicher
摘要
We have studied the effects of low-temperature sputter preparation and subsequent heat treatment of Co79Cr21 thin films with emphasis on their microstructure and magnetic properties. Preparation at −196 °C resulted in textured films which did not show the presence of magnetic Co-rich regions. The saturation magnetization moment, Ms, of these films was similar to their homogeneous alloy phase. Conventionally sputtered films (substrate temperature>room temperature) had higher values of Ms than films prepared at −196 °C. A 1-h heat treatment at 500 °C in vacuum reduced the Ms of both films. The results suggest rearrangement of atoms through thermal diffusion. For the films sputtered at −196 °C (liquid-nitrogen temperature) an atomistically ordered phase can be proposed based on hexagonal Co which minimizes the presence of nearest Cr-Cr neighbors. This maximizes the moment quenching activity of Cr on Co and reduces the saturation moment over the one of a fully random material for segregated films prepared at higher temperature reductions in Ms can also be due to dilution of Co concentration in Co-rich regions.
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