铁电性
材料科学
掺杂剂
矫顽力
电介质
极化(电化学)
薄膜
离子半径
偶极子
凝聚态物理
分析化学(期刊)
兴奋剂
离子注入
离子
光电子学
纳米技术
化学
物理
有机化学
物理化学
色谱法
作者
Chengjun Zou,M. Li,H.J. Wang,M.L. Yin,C.S. Liu,Liping Guo,Dejun Fu,Tae Won Kang
标识
DOI:10.1016/j.nimb.2009.01.004
摘要
ZnO:Li thin films were prepared by implantation of ZnO with a Li ion fluence 5 × 1016 ions/cm2 at implantation energies of 50, 100, 200 keV. Ferroelectric characterization of the implanted samples revealed a clear hysteresis in the polarization-field curves. The origin of the ferroelectricity can be attributed to an off-center dipole caused by the large difference in ionic radii between the host Zn (0.74 Å) and the dopant Li (0.60 Å). ZnO:Li films which were implanted at 200 keV and annealed at a temperature of 700 °C exhibited a well-defined polarization hysteresis loop, with a remanent polarization of 0.8 μC/cm2 and coercive field of 8.2 kV/cm, at room temperature. The dielectric phase transition was observed in the temperature range from 340 to 360 K. It is concluded that this novel ferroelectric phase transition in ZnO:Li results from the small structural distortion induced along the c-axis.
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