压电响应力显微镜
开尔文探针力显微镜
显微镜
极化(电化学)
静电力显微镜
材料科学
振幅
非接触原子力显微镜
光谱学
铁电性
光学
扫描探针显微镜
扫描电容显微镜
光电子学
纳米技术
原子力显微镜
化学
物理
电介质
物理化学
扫描共焦电子显微镜
量子力学
作者
Chin Chyi Loo,Sha Shiong Ng,Wen-Kuei Chang
标识
DOI:10.1017/s143192762200085x
摘要
The surging interest in manipulating the polarization of piezo/ferroelectric materials by means of light has driven an increasing number of studies toward their light-polarization interaction. One way to investigate such interaction is by performing piezoresponse force microscopy (PFM) while/after the sample is exposed to light illumination. However, caution must be exercised when analyzing and interpreting the data, as demonstrated in this paper, because sizeable photo-response observed in the PFM amplitude image of the sample is shown to be caused by the electrostatic interaction between the photo-induced surface charge and tip. Through photo-assisted Kelvin probe force microscopy (KPFM), positive surface potential is found to be developed near the sample's surface under 405 nm light illumination, whose effects on the measured PFM signal is revealed by the comparative studies on its amplitude curves that are obtained using PFM spectroscopy mode with/without illumination. This work exemplifies the need for complementary use of KPFM, PFM imaging mode, and PFM spectroscopy mode in order to distinguish real behavior from artifacts.
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