材料科学
残余应力
纹理(宇宙学)
微观结构
复合材料
纤维
微晶
无定形固体
压力(语言学)
基质(水族馆)
衍射
冶金
结晶学
光学
物理
地质学
图像(数学)
哲学
人工智能
海洋学
化学
语言学
计算机科学
作者
Jeyun Yeom,Giacomo Lorenzin,Claudia Cancellieri,Jolanta Janczak‐Rusch
标识
DOI:10.1016/j.matlet.2023.135074
摘要
Residual stresses are one of the key factors for tuning the properties, microstructure, and reliability of thin films and nanomultilayers, but their measurement and evaluation are challenging. Residual stresses in nanomultilayers with {1 1 0} out-of-plane texture exhibit a dependence on the in-plane crystal orientation, which complicates their evaluation using X-ray diffraction. The texture and residual stresses were investigated for two representative nanomultilayers of immiscible materials with fcc/bcc structure: Cu/Mo and Cu/Nb grown on Si substrate with an amorphous silicon nitride layer. Both multilayered structures exhibited Cu {1 1 1} // Mo, respectively Nb {1 1 0} out-of-plane fiber texture, and showed compressive stress. A modified crystallite group method for {1 1 0}, {1 1 1} fiber texture was used to determine residual stresses in the nanomultilayers. The method was proven to be a good tool to extract the residual stress in nanomultilayers with a strong fiber texture.
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