溶解
腐蚀
氧化物
材料科学
冶金
点蚀
高熵合金
无机化学
化学
微观结构
物理化学
作者
Masaaki Kato,Masashi Nishimoto,Izumi Muto,Yu Sugawara
标识
DOI:10.1016/j.corsci.2023.110982
摘要
In oxide films on CoCrCuFeNi medium-entropy alloys with Cu contents of 0–5 at%, Cu existed as CuO, and the concentration increased with increasing Cu content in the alloys. Active dissolution in HCl was suppressed by the addition of Cu. The pitting potential in NaCl increased with the addition of 1 at% Cu, but it decreased with the addition of 3 at% Cu or more. The role of Cu was clarified by relating the active dissolution rate and pitting potential. In addition, the effects of Mo and W are discussed.
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