Low-frequency noise characteristics of indium–gallium–zinc oxide ferroelectric thin-film transistors with metal–ferroelectric–metal–insulator–semiconductor structure

We investigate the low-frequency noise characteristics of indium–gallium–zinc oxide ferroelectric thin-film transistors (FeTFTs) with a metal–ferroelectric–metal–insulator–semiconductor (MFMIS) structure. MFMIS FeTFTs are fabricated with different metal-to-FE area ratios (AM/AF's). It is revealed that the noise generation mechanism differs depending on the operation region [low and high drain current (ID) regions] and AM/AF. Excess noise in the low ID region is observed in the MFMIS FeTFTs with AM/AF's of 4 and 6 due to carrier mobility fluctuations. In the high ID region, the carrier number fluctuation generates the 1/f noise of the devices regardless of the AM/AF.