硫族元素
材料科学
激子
单层
空位缺陷
密度泛函理论
半导体
价(化学)
分子物理学
光电子学
凝聚态物理
纳米技术
结晶学
计算化学
化学
物理
有机化学
作者
Zhepeng Zhang,Haidong Liang,Leyi Loh,Yifeng Chen,Yuan Chen,Kenji Watanabe,Takashi Taniguchi,Su Ying Quek,Michel Bosman,A.A. Bettiol,Goki Eda
标识
DOI:10.1002/adom.202201350
摘要
Abstract Defect engineering of atomically thin semiconducting crystals is an attractive route to developing single‐photon sources and valleytronic devices. For these applications, defects with well‐defined optical characteristics need to be generated in a precisely controlled manner. However, defect‐induced optical features are often complicated by the presence of multiple defect species, hindering the identification of their structural origin. Here, we report systematic generation of optically active atomic defects in monolayer MoS 2 , WS 2 , MoSe 2 , and WSe 2 via proton‐beam irradiation. Defect‐induced emissions are found to occur ≈100 to 200 meV below the neutral exciton peak, showing typical characteristics of localized excitons such as saturation at high‐excitation rates and long lifetime. Using scanning transmission electron microscopy, it is shown that freshly created chalcogen vacancies are responsible for the localized exciton emission. Density functional theory and ab initio GW plus Bethe‐Salpeter‐equation calculations reveal that the observed emission can be attributed to transitions involving defect levels of chalcogen vacancy and the valence band edge state.
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