材料科学
电介质
原子层沉积
光电子学
铁电性
场效应晶体管
制作
高-κ电介质
晶体管
图层(电子)
铪
纳米技术
分析化学(期刊)
电压
锆
电气工程
冶金
病理
替代医学
化学
工程类
医学
色谱法
作者
Jehoon Lee,Deokjoon Eom,Heesoo Lee,Woohui Lee,Joo-Hee Oh,Changyu Park,Hyoungsub Kim
标识
DOI:10.1088/1361-6463/ad1543
摘要
Abstract In this study, the effects of an Al 2 O 3 interfacial layer (IL) on the characteristics of ferroelectric field-effect transistors (FeFETs) with Hf 0.5 Zr 0.5 O 2 (HZO) gate dielectrics on Si substrates were investigated. FeFETs with HZO gate dielectrics have gained considerable attention owing to their compatibility with modern fabrication processes and scalability. However, during HZO deposition on Si substrates, an ultrathin metal silicate IL with a low dielectric constant is formed in an uncontrolled manner, leading to a significant voltage drop and the generation of interface traps during device operation. To address this issue, an ultrathin Al 2 O 3 IL with a thickness less than 2 nm was introduced between the HZO film and Si substrate via in situ atomic layer deposition. The impact of this IL on a memory window (MW) and endurance characteristics was evaluated by comparing the devices with and without an intentional Al 2 O 3 IL. The obtained results revealed that the Al 2 O 3 IL effectively suppressed the interface trap generation, expanded the MW, and enhanced the transistor endurance characteristics. This described approach can be potentially used for improving the reliability of FeFETs fabricated on Si substrates.
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