微电子
MOSFET
半导体
硅
材料科学
量子
可靠性(半导体)
载流子
工程物理
氢
非平衡态热力学
半导体器件
纳米技术
凝聚态物理
化学物理
光电子学
化学
物理
热力学
量子力学
晶体管
电压
功率(物理)
图层(电子)
作者
Markus Jech,Al-Moatasem El-Sayed,Stanislav Tyaginov,Dominic Waldhör,Foudhil Bouakline,Peter Saalfrank,Dominic Jabs,Christoph Jungemann,Michael Waltl,Tibor Grasser
出处
期刊:Physical review applied
[American Physical Society]
日期:2021-07-09
卷期号:16 (1)
被引量:7
标识
DOI:10.1103/physrevapplied.16.014026
摘要
Silicon-hydrogen bonds play a crucial role in modern microelectronics, especially regarding reliability. At the semiconductor-oxide interface these bonds are broken via interaction with energetic charge carriers, which spoils a MOSFET's performance, for example. This study develops a consistent physical picture of that phenomenon through a bottom-up approach based on quantum mechanical formulations, and also unravels the disparity of that effect in $n\ensuremath{-}$ and $p\ensuremath{-}$MOSFETs. The model is free of empirical parameters and can easily be extended to emerging material combinations.
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