Next Generation Medium Current Product: VIISta 900XPT

Device fabrication requirements for 32 nm and 28 nm technologies further increase the demands on medium current implanters for higher process quality as well as for increased productivity and flexibility. Angle control requirements continue to become more stringent with scaling of device geometries. Pressure for reduced CoO drives the need for higher productivity and this, in turn, drives requirements for tuning time with precise angle control that are substantially more aggressive than for older generation tools. Additionally, dose control and defect control standards have become more demanding. We discuss these requirements in more detail and describe the improvements that have been made to Varian's next generation medium current tool in order to meet them.