材料科学
化学气相沉积
沉积(地质)
薄膜
原子层沉积
X射线光电子能谱
真空沉积
图层(电子)
超高真空
蒸发
燃烧化学气相沉积
物理气相沉积
光电子学
分析化学(期刊)
化学工程
纳米技术
碳膜
化学
物理
沉积物
色谱法
古生物学
工程类
热力学
生物
作者
Theodor Weiss,Martin A. Nowak,Udo Mundloch,Volkmar Zielasek,Katharina Kohse‐Höinghaus,Marcus Bäumer
摘要
Optimizing thin film deposition techniques requires contamination-free transfer from the reactor into an ultrahigh vacuum (UHV) chamber for surface science analysis. A very compact, multifunctional Chemical Vapor Deposition (CVD) reactor for direct attachment to any typical UHV system for thin film analysis was designed and built. Besides compactness, fast, easy, and at the same time ultimately clean sample transfer between reactor and UHV was a major goal. It was achieved by a combination of sample manipulation parts, sample heater, and a shutter mechanism designed to fit all into a NW38 Conflat six-ways cross. The present reactor design is versatile to be employed for all commonly employed variants of CVD, including Atomic Layer Deposition. A demonstration of the functionality of the system is provided. First results of the setup (attached to an Omicron Multiprobe x-ray photoelectron spectroscopy system) on the temperature dependence of Pulsed Spray Evaporation-CVD of Ni films from Ni acetylacetonate as the precursor demonstrate the reactor performance and illustrate the importance of clean sample transfer without breaking vacuum in order to obtain unambiguous results on the quality of CVD-grown thin Ni films. The widely applicable design holds promise for future systematic studies of the fundamental processes during chemical vapor deposition or atomic layer deposition.
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