材料科学
纳米技术
硅
纳米孔
制作
氧化硅
电子束光刻
蚀刻(微加工)
透射电子显微镜
纳米
光电子学
抵抗
复合材料
氮化硅
替代医学
病理
医学
图层(电子)
作者
Arnold J. Storm,J. H. Chen,Xinsheng Ling,H.W. Zandbergen,Cees Dekker
出处
期刊:Nature Materials
[Springer Nature]
日期:2003-07-11
卷期号:2 (8): 537-540
被引量:1281
摘要
Single nanometre-sized pores (nanopores) embedded in an insulating membrane are an exciting new class of nanosensors for rapid electrical detection and characterization of biomolecules. Notable examples include alpha-hemolysin protein nanopores in lipid membranes and solid-state nanopores in Si3N4. Here we report a new technique for fabricating silicon oxide nanopores with single-nanometre precision and direct visual feedback, using state-of-the-art silicon technology and transmission electron microscopy. First, a pore of 20 nm is opened in a silicon membrane by using electron-beam lithography and anisotropic etching. After thermal oxidation, the pore can be reduced to a single-nanometre when it is exposed to a high-energy electron beam. This fluidizes the silicon oxide leading to a shrinking of the small hole due to surface tension. When the electron beam is switched off, the material quenches and retains its shape. This technique dramatically increases the level of control in the fabrication of a wide range of nanodevices.
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