原子层沉积
纳米技术
半导体工业
薄膜
沉积(地质)
电致发光
材料科学
图层(电子)
原子层外延
工程物理
光电子学
工程类
制造工程
地质学
沉积物
古生物学
作者
Mikko Ritala,Jaakko Niinistö
出处
期刊:ECS transactions
[The Electrochemical Society]
日期:2009-09-25
卷期号:25 (8): 641-652
被引量:120
摘要
This year marks the 35th anniversary of the Atomic Layer Deposition (ALD) technology. While the development of ALD was motivated and successfully demonstrated by thin film electroluminescent display production, otherwise the industrial use of ALD remained marginal for more than two decades. Recently the interest toward ALD has increased remarkably and the technique is currently one of the most rapidly developing fields of thin film technology. Major driver for this development has been semiconductor industry, but ALD has found industrial applications also in other areas, like magnetic recording heads, optics and protective coatings. This paper reviews the current application areas of ALD and makes some remarks about new potential applications for ALD.
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