石墨烯
异质结
肖特基势垒
材料科学
范德瓦尔斯力
单层
光电子学
肖特基二极管
带隙
凝聚态物理
纳米技术
化学
物理
分子
二极管
有机化学
作者
Khang D. Pham,Nguyen N. Hieu,Victor V. Ilyasov,Huynh V. Phuc,Bui D. Hoi,E. Feddi,Nguyen V. Thuan,Chuong V. Nguyen
标识
DOI:10.1016/j.spmi.2018.06.049
摘要
Graphene-based van der Waals heterostructures by stacking graphene on other two-dimensional materials have recently attracted much attention due to their extraordinary properties and greatly extend the applications of the parent materials. By means of the density functional theory from first-principles calculations, in this work, the electronic properties and Schottky contact of the Graphene/InSe heterostructure, together with the effect of strain, are investigated systematically. Our results show that in the graphene/InSe heterostructure, graphene is very weakly bound to the InSe monolayer. Furthermore, we find that due to the sublattice symmetry breaking, a tiny band gap of 5 meV is opened in the graphene/InSe heterostructure, making it suitable for applications in electronic and optoelectronic devices. Moreover, we also find that the n-type Schottky contact is formed in the graphene/InSe heterostructure with a very small Schottky barrier height of 0.05 eV. The Schottky barrier height as well as Schottky contact types in the graphene/InSe heterostructure could be controlled by vertical strain applied perpendicularly to the heterostructure. When the interlayer distance between graphene and the topmost InSe monolayer is smaller than 2.40 Å, one can observe a transformation of the Schottky contact of the graphene/InSe heterostructure. Our results may provide helpful information for designing novel high-performance graphene-based van der Waals heterostructures and explore their potential applications in future nanoelectronic and optoelectronic devices.
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