原子层沉积
材料科学
织物
凯夫拉
化学工程
分子
图层(电子)
吸附
纳米技术
高分子化学
复合材料
化学
有机化学
复合数
工程类
作者
Il‐Kwon Oh,Jong Seo Park,Mohammad Rizwan Khan,Kangsik Kim,Zonghoon Lee,Bonggeun Shong,Han‐Bo‐Ram Lee
标识
DOI:10.1021/acs.chemmater.9b03171
摘要
The reaction mechanism of Pt atomic layer deposition (ALD) on various commercial textiles such as cotton, silk, nylon, wool, Kevlar, and Nomex was fundamentally investigated. Pt morphologies on textiles were observed, and it was determined that Pt layers were uniformly deposited on most textile surfaces except nylon, where no notable Pt growth was observed. Morphological analysis, chemical composition measurements as a function of Pt ALD cycles, and the results of quantum chemical calculations enabled the elucidation of the role of the textiles and Pt growth mechanism. The calculated reaction pathways and energy states of Pt precursor molecules that adsorbed on each textile moiety showed different reaction paths, resulting in various Pt ALD growth behaviors. On the basis of the Pt ALD process, a textile resistive heater was fabricated, showing good performance with high stability such as wear rate, high bending stability, and long life.
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