光电子学
沟槽
材料科学
肖特基势垒
肖特基二极管
金属半导体结
图层(电子)
二极管
阻挡层
工程物理
纳米技术
物理
作者
Xuchen Gao,Feng He,Fuping Huang,Zhizhong Wang,Chunshuang Chu,Kangkai Tian,Yonghui Zhang,Zi‐Hui Zhang
标识
DOI:10.35848/1347-4065/ad40eb
摘要
Abstract Using numerical simulation tools, this work systematically investigates the impact of bulk defects in the drift layer on GaN-based trench metal–insulator–semiconductor barrier-controlled Schottky rectifiers. Investigations show that in forward conduction, the acceptor-type defects significantly increase the on-resistance ( R on.sp ). When the device is in reverse blocking mode, donor-type defects tend to weaken the charge-coupling effect, leading to early breakdown of the device, while acceptor-type defects show the opposite feature. In addition, our report identifies that the reverse blocking effect is significantly impacted when the defects are located in the region with maximum electric field magnitude. We also find that the acceptor-type traps generate a remarkable charging/discharging effect, which will destabilize the dynamic forward conduction process. Hence, we numerically prove that bulk defects should be avoided in actual power diodes.
科研通智能强力驱动
Strongly Powered by AbleSci AI