傅里叶变换
材料科学
热的
电子工程
计算机科学
纳米尺度
纳米电子学
光电子学
工程物理
物理
纳米技术
工程类
量子力学
气象学
作者
Yufei Sheng,Li Wang,Yue Hu,Jiaxuan Xu,Zhigang Ji,Hua Bao
标识
DOI:10.1109/ted.2024.3357440
摘要
Thermal analysis is an essential component of semiconductor device simulation for device design and thermal management. The prevalent approach of device thermal analysis uses Fourier-law-based heat diffusion equation (HDE). However, Fourier's law is known to fail when the characteristic length is smaller than the phonon mean free path (MFP), resulting in a significant underestimation of local temperature rise. In this study, we implement non-Fourier thermal analysis on nanoscale devices using the first-principles-based nongray Boltzmann transport equation (BTE). A 3-D structure of nanoscale silicon-based FinFET is adopted as a case study. Non-Fourier effects are considered in both thermal generation and transport processes. In the thermal generation process, we use first-principles methods to investigate the selective electron–phonon energy transfer process and obtain the mode-level phonon generation rates. In the thermal transport process, we solve the nongray phonon BTE to determine the temperature distribution of the devices, in which the material-dependent phonon properties are calculated by first-principles methods. Through comparisons with HDE and previous models, we demonstrate the considerable impact of non-Fourier effects on temperature rise and electrical performance, highlighting the significance of incorporating non-Fourier thermal analysis into nanoscale device simulations. Our method also shows good agreement with experimental temperature measurements, which can be readily extended to a variety of devices and operating conditions.
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