Effects of different Si-interlayer deposition time on the adhesive properties of DLC films

In this study,the twinned microwave ECR plasma source enhanced ion implantation system was used to prepared graded diamond-like carbon(DLC) film through hybrid physical vapor deposition(PVD) and plasma enhanced chemical vapor deposition(PECVD) methods.Graded films of Si/(Si/α-C∶H)/DLC films were investigated.Raman spectra and TEM confirmed the diamond-like characteristics of as-received graded DLC films.The CSR-01 system was employed to obtain information about the scratch resistance of graded DLC films in different deposited time(20,30,60 and 90min,respectively).The test results showed that the Si graded layer deposited in 60 min provided the best adhesion strength between the graded DLC film and NiTi alloy substrate.There existed poor adhesion between graded DLC films and NiTi alloy substrate once the deposition time was above or under the value.