MOSFET
对偶(语法数字)
肖特基二极管
材料科学
光电子学
电气工程
电子工程
计算机科学
工程类
晶体管
电压
二极管
文学类
艺术
作者
Ping Li,Da Wang,Zhi Lin,Rongyao Ma,Shengdong Hu
标识
DOI:10.1109/ted.2024.3389634
摘要
In this article, we demonstrate the experimental results of a 650-V superjunction MOSFET (SJ-MOSFET) featuring dual Schottky contacts at the source side to reduce the reverse recovery charge ( $\textit{Q}_{\text{rr}}\text{)}$ of its body diode. The n-type Schottky contact suppresses the operation of the p-n junction, and the p-type Schottky contact lowers the hole injection efficiency further. Both of them reduce $\textit{Q}_{\text{rr}}$ . According to the experimental results, $\textit{Q}_{\text{rr}}$ of the proposed SJ-MOSFET (1.4 $\mu$ C) is 20.5% of that of the conventional device (6.8 $\mu$ C) and 38.9% of that of the device with only n-type Schottky contact (3.6 $\mu$ C). The forward voltage drop of its body diode is 0.91 V, which is 0.07 V higher than that of the conventional device and 0.09 V higher than that of the device with only n-type Schottky contact. These characteristics make it be suitable for high-speed switching applications.
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