材料科学
电介质
X射线光电子能谱
拉曼光谱
光电子学
栅极电介质
结晶度
透射电子显微镜
半导体
铋
电容器
高-κ电介质
纳米技术
晶体管
光学
化学工程
电气工程
复合材料
工程类
冶金
物理
电压
作者
Aswin L. N. Kondusamy,Wenhao Liu,J. Roy,Xiangyu Zhu,Chris Smith,Xinglu Wang,Moon J. Kim,Chadwin D. Young,Robert M. Wallace,William G. Vandenberghe,Bing Lv
标识
DOI:10.1088/1361-6528/adc00c
摘要
Abstract Two-dimensional (2D) semiconductors have received a lot of attention as the channel material for the next generation of transistors and electronic devices. On the other hand, insulating 2D gate dielectrics, as possible materials for gate dielectrics in transistors, have received little attention. We performed an experimental study on bismuth oxychloride, which is theoretically proposed to have good dielectric properties. High-quality bismuth oxychloride single crystals have been synthesized, and their high single crystallinity and spatial homogeneity have been thoroughly evidenced by X-ray diffraction, Raman spectroscopy, X-ray Photoelectron Spectroscopy (XPS), Transmission Electron Microscopy (TEM), and Scanning Transmission Electron Microscopy (STEM) studies. We then mechanically exfoliated high-quality BiOCl crystals to fabricate Metal-Insulator-Metal (MIM) capacitors and measured the dielectric properties at various frequencies and different thicknesses. We found that BiOCl exhibits an out-of-plane static dielectric constant up to 11.6, which is 3 times higher than 2D h-BN making it a suitable candidate for 2D dielectrics. We also carried out cross-section TEM studies to look into the MIM interface and provide some future directions for their integration with metal-dielectric interfaces and possibly with other 2D devices.
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