电容器
材料科学
量子隧道
普尔-弗伦克尔效应
热传导
光电子学
薄膜
半导体
大气温度范围
凝聚态物理
纳米技术
电压
电气工程
复合材料
热力学
工程类
物理
作者
Daniel Rocha-Aguilera,Joel Molina
摘要
In this work, a study comprising the electrical characterization and analysis of the electrical response of metal–insulator–semiconductor Al/Al2O3/Si capacitors in a temperature range from ambient temperature down to 3.6 K is presented. An ultra-thin 6 nm Al2O3 film, deposited by atomic layer deposition, was used as an insulating layer. Current–voltage and electrical stress measurements were performed on the capacitors in the specified temperature range, and the experimental data obtained were analyzed using current transport equations to model the conduction mechanisms that allow charge transport through the Al2O3. Energetic parameters associated with trap levels within the Al2O3 bandgap corresponding to the Poole–Frenkel emission and trap-assisted tunneling mechanisms were obtained, and their temperature dependances were studied and associated with the presence of physical material defects. The analysis of the modeling results points to trap-assisted tunneling as the dominant mechanism at low temperatures for intermediate electric field values. Additional phenomena that limit charge transport were also observed, such as charge trapping in the bulk of the Al2O3 upon the application of electrical stress at ambient temperature and silicon freeze out at cryogenic temperatures. Our findings constitute an effort at understanding the physical phenomena that govern the electrical behavior of thin-film Al2O3-based capacitors, especially at cryogenic temperatures, given that these materials and devices are of considerable importance for applications in CMOS-based cryoelectronics and quantum technologies, among others.
科研通智能强力驱动
Strongly Powered by AbleSci AI