Ga2O3/NiO junction barrier Schottky diodes with ultra-low barrier TiN contact

肖特基势垒 材料科学 金属半导体结 光电子学 二极管 非阻塞I/O 化学 冶金 生物化学 催化作用
作者
Hehe Gong,Na Sun,Tiancheng Hu,Xinxin Yu,Matthew Porter,Zineng Yang,Fangfang Ren,Shulin Gu,Youdou Zheng,Rong Zhang,Yuhao Zhang,Jiandong Ye
出处
期刊:Applied Physics Letters [American Institute of Physics]
卷期号:124 (23) 被引量:25
标识
DOI:10.1063/5.0211124
摘要

Power Schottky barrier diodes (SBDs) face an inherent trade-off between forward conduction loss and reverse blocking capability. This limitation becomes more severe for ultra-wide bandgap (UWBG) SBDs due to the large junction field. A high Schottky barrier is usually required to suppress the reverse leakage current at the price of an increased forward voltage drop (VF). This work demonstrates a Ga2O3 junction barrier Schottky (JBS) diode that employs the embedded p-type NiO grids to move the peak electric field away from the Schottky junction, thereby allowing for the use of an ultra-low barrier TiN Schottky contact. This JBS diode concurrently realizes a low VF of 0.91 V (at forward current of 100 A/cm2) and a high breakdown voltage over 1 kV, with the VF being the lowest in all the reported vertical UWBG power diodes. Based on the device characteristics measured up to 200 °C, we further analyze the power loss of this JBS diode across a wide range of operational duty cycles and temperatures, which is found to outperform the TiN/Ga2O3 SBDs or NiO/Ga2O3 PN diodes. These findings underscore the potential of low-barrier UWBG JBS diodes for high-frequency, high-temperature power electronics applications.
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