残余应力
抗弯刚度
材料科学
静水应力
极限抗拉强度
流体静力平衡
静水压力
复合材料
有限元法
刚度(电磁)
薄膜
残余物
压力(语言学)
线弹性
弹性(物理)
结构工程
机械
数学
物理
纳米技术
工程类
哲学
语言学
量子力学
算法
作者
Kai‐Tak Wan,Shu Guo,David Dillard
标识
DOI:10.1016/s0040-6090(02)01103-3
摘要
Tensile residual stress in a plate or membrane clamped at the perimeter can be measured by either applying a uniform hydrostatic pressure or a central load via a cylindrical punch (with several different loading configurations). Analytical constitutive relations are derived here based on an average membrane stress approximation and are compared to finite element analysis results. The thickness and flexural rigidity of the film are not confined to a small range but will span a wide spectrum. The elastic responses of the blistering films are shown to be linear when the film is thick, relatively rigid, or subjected to a large residual stress, and cubic when the film is thin, flexible, or under a small residual stress. The linear-to-cubic transition is formulated.
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