外延
超晶格
拉曼光谱
雅恩-泰勒效应
材料科学
凝聚态物理
压力(语言学)
失真(音乐)
互易晶格
结晶学
光电子学
化学
光学
纳米技术
衍射
物理
离子
哲学
有机化学
CMOS芯片
语言学
放大器
图层(电子)
作者
Xin Chen,Baohua Wang,Tongxin Ge,Haoming Wei,Bingqiang Cao
标识
DOI:10.1088/1361-648x/ac3f02
摘要
Abstract The effect of epitaxial stress on Jahn–Teller (JT) distortion in epitaxial LaMnO 3 (LMO) films has been investigated. Both 2θ – ω scans and reciprocal space maps (RSMs) indicate that LMO samples are subjected to compressive stress. Obvious Laue oscillations can be detected in 2θ – ω scans, indicating the high quality of samples. RSMs of symmetry peak (001) and asymmetry peak (−103) imply different epitaxial stress for LMO films deposited on different substrates. Raman spectra measurements reveal that the degree of JT distortion can be well tuned via the epitaxial stress which may further influence on the electron localization in the films. This study might benefit to understanding the correlation between crystalline structure and electrical transport properties of LMO films and related LMO-based superlattices.
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